IRIS publication 241769372
Inductively coupled plasma deep etching of InP/InGaAsP in Cl 2/CH 4/H 2 based chemistries with the electrode at 20° C
RIS format for Endnote and similar
TY - JOUR - Wieczorek, Andreas and Djara, Vladimir and Peters, Frank H and OCallaghan, James and Thomas, Kevin and Corbett, Brian - 2012 - January - Journal of Vacuum Science \; Technology B: Microelectronics and Nanometer Structures - Inductively coupled plasma deep etching of InP/InGaAsP in Cl 2/CH 4/H 2 based chemistries with the electrode at 20° C - Validated - 30 - 5 - 051208 - 051208 DA - 2012/01 ER -
BIBTeX format for JabRef and similar
@article{V241769372, = {Wieczorek, Andreas and Djara, Vladimir and Peters, Frank H and OCallaghan, James and Thomas, Kevin and Corbett, Brian}, = {2012}, = {January}, = {Journal of Vacuum Science \; Technology B: Microelectronics and Nanometer Structures}, = {Inductively coupled plasma deep etching of InP/InGaAsP in Cl 2/CH 4/H 2 based chemistries with the electrode at 20° C}, = {Validated}, = {30}, = {5}, pages = {051208--051208}, source = {IRIS} }
Data as stored in IRIS
AUTHORS | Wieczorek, Andreas and Djara, Vladimir and Peters, Frank H and OCallaghan, James and Thomas, Kevin and Corbett, Brian | ||
YEAR | 2012 | ||
MONTH | January | ||
JOURNAL | Journal of Vacuum Science \; Technology B: Microelectronics and Nanometer Structures | ||
TITLE | Inductively coupled plasma deep etching of InP/InGaAsP in Cl 2/CH 4/H 2 based chemistries with the electrode at 20° C | ||
STATUS | Validated | ||
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VOLUME | 30 | ||
ISSUE | 5 | ||
START_PAGE | 051208 | ||
END_PAGE | 051208 | ||
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