. ¿Exploitation of Modern Multilayer Metallisation Schemes for Accurate CMOS/BiCMOS Device Characterisation at High Frequencies¿.

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TY  - CONF
  - O¿Sullivan, J.A., McCarthy, K.G., Murphy, P.J
  - . Royal Irish Academy Colloquium on Physical Layer Wireless Communications
  - . ¿Exploitation of Modern Multilayer Metallisation Schemes for Accurate CMOS/BiCMOS Device Characterisation at High Frequencies¿.
  - 2006
  - April
  - Validated
  - 1
  - ()
  - 131
  - 27-APR-06
DA  - 2006/04
ER  - 
@inproceedings{V26999540,
   = {O¿Sullivan,  J.A. and  McCarthy,  K.G. and  Murphy,  P.J },
   = {. Royal Irish Academy Colloquium on Physical Layer Wireless Communications},
   = {{. ¿Exploitation of Modern Multilayer Metallisation Schemes for Accurate CMOS/BiCMOS Device Characterisation at High Frequencies¿.}},
   = {2006},
   = {April},
   = {Validated},
   = {1},
   = {()},
  pages = {131},
  month = {Apr},
  source = {IRIS}
}
AUTHORSO¿Sullivan, J.A., McCarthy, K.G., Murphy, P.J
TITLE. Royal Irish Academy Colloquium on Physical Layer Wireless Communications
PUBLICATION_NAME. ¿Exploitation of Modern Multilayer Metallisation Schemes for Accurate CMOS/BiCMOS Device Characterisation at High Frequencies¿.
YEAR2006
MONTHApril
STATUSValidated
PEER_REVIEW1
TIMES_CITED()
SEARCH_KEYWORD
EDITORS
START_PAGE131
END_PAGE
LOCATION
START_DATE27-APR-06
END_DATE
ABSTRACT
FUNDED_BY
URL
DOI_LINK
FUNDING_BODY
GRANT_DETAILS