TY  - 
  - Other
  - Chen, WB, O'Sullivan, JA, McCarthy, KG
  - 2008
  - August
  - Dielectric Characterization For Novel High-K Thin Films Using Microwave Techniques
  - Validated
  - 1
  - ()
  - This paper addresses the issue of novel high-k material thin film characterization through wafer-probe measurements and electromagnetic simulation (EM) of coplanar waveguides. The dielectric constant of an alumina substrate has been successfully extracted from s-parameter measurements of a coplanar waveguide. Verification lines on the impedance standard substrate (ISS) substrates have been used as a method to test a dielectric constant extraction technique and also to test the accuracy of EM simulations. The characteristic impedance and the effective dielectric constant for CPW are predicted using electromagnetic simulation..
  - 631
  - 634
DA  - 2008/08
ER  - 

@misc{V722077,
   = {Other},
   = {Chen,  WB and  O'Sullivan,  JA and  McCarthy,  KG },
   = {2008},
   = {August},
   = {Dielectric Characterization For Novel High-K Thin Films Using Microwave Techniques},
   = {Validated},
   = {1},
   = {()},
   = {{This paper addresses the issue of novel high-k material thin film characterization through wafer-probe measurements and electromagnetic simulation (EM) of coplanar waveguides. The dielectric constant of an alumina substrate has been successfully extracted from s-parameter measurements of a coplanar waveguide. Verification lines on the impedance standard substrate (ISS) substrates have been used as a method to test a dielectric constant extraction technique and also to test the accuracy of EM simulations. The characteristic impedance and the effective dielectric constant for CPW are predicted using electromagnetic simulation..}},
  pages = {631--634},
  source = {IRIS}
}